Inspection System (Electron)
Industrial Automation Technology
PLCs
RM47,000
Description
| Specification | Typical Value / Details |
|---|---|
| Resolution | 1.0 – 5.0 nm (standard SEM), <1.0 nm for high-resolution SEM |
| Magnification Range | 10× – 1,000,000× |
| Electron Beam Energy | 0.5 – 30 keV |
| Accelerating Voltage | 0.5 kV to 30 kV (adjustable) |
| Imaging Modes | SE (Secondary Electron), BSE (Backscatter), EDS (X-ray analysis) |
| Specimen Chamber | Size: 100mm – 300mm stage, multi-axis movement |
| Vacuum System | Turbo molecular + rotary pump (for high vacuum operation) |
| Stage Movement | X-Y-Z tilting ±90°, rotation ±360°, resolution: <1 µm |
| Sample Size Capacity | Up to 6″ wafer (150mm), depending on chamber size |
| Detector Options | SE detector, BSE detector, EDS (Energy-dispersive X-ray) |
| Software Functions | Auto-focus, auto-contrast, image stitching, defect marking |
| Control Interface | PC-based software with joystick stage control |
| Environmental Conditions | Room temperature (20–25°C), low-vibration floor |
B-01-01 Plaza Damas 3, No 60, Jalan Sri Hartamas 1, Taman Sri Hartamas, 50480, Kuala Lumpur
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